Photoveel II and Photoveel II-S - Machinable Nitride Ceramics

Photoveel II and Photoveel II-S are the enabling materials for the next generation probe card. Holes with diameters as small as 40 microns and 60 micron pitch can be drilled into Photoveel II and II-S.

Applications

  • Various Inspection Parts
  • Insulation parts for micro machining
Photoveel II Products Photo
Silicon Nitride Ceramics Products Photo

Photoveel II Products Photo

Properties of Photoveel II & Photoveel II-S

      Photoveel II Photoveel II-S
General Properties Characteristics High strength High strength
Main Component Purity (wt%) - -
Color Gray Gray
Density (g/cm3) 2.56 3.5
Water Absorption (%) 0 0
Mechanical Properties Bending Strength (MPa) 440 320
Young's Modulus (GPa) 157 130
Vickers Hardness (GPa) 2.3 2.3
Thermal Properties Max.Operating Temperature (°C) 1000
(In nonoxidizing atmosphere)
1000
(In nonoxidizing atmosphere)
Coefficient of Thermal Expansion (1/°C×10-6) 1.4 (RT~400°C) 4.7 (RT~150°C)
Coefficient of Thermal Conductivity (W/m×K) 50 23
Thermal Shock Resistance ΔT (°C) 600 400
Electrical Properties Volume Resistivity 25°C 2.2×1015 1015
300°C - -
500°C - -
800°C - -
Dielectric Constant 10GHz 5.5 9
Dielectric Loss (×10-4) 10 25
Q Factor (×104) 0.1 0.04
Dielectric Breakdown Voltage (KV/mm) 35 30